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TECHNOLOGY
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Crystal GrowthThere are two primary technologies employed today to grow silicon carbide:
After an extensive R&D effort, a new bulk growth method was discovered by Caracal scientists in 2005. This approach leverages the advantages of HTCVD while overcoming its limitations. Specifically, the process is designed to lower the required growth temperature and thermal gradient, which puts less strain on the materials, resulting in lower defects. The degradation rate of the graphite crucible is also reduced. The net effect is higher purity silicon carbide of greater boule length. We have applied for 3 different patents covering both the process and apparatus of this new growth technique. Our new growth process occurs in bulk reactors custom designed by Caracal scientists, and built in-house to exacting specifications. We believe these reactors are unique in the world, and set a new standard in silicon carbide bulk reactor technology. In the design of the reactors, a particular emphasis has been placed on efficiency of operation. Reactor runtime is maximized and operator involvement is minimized through a recipe-driven, fully automated control system.
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Caracal
611 Eljer Way, Ford City, PA 16226
724.763.2111
fax: 724.763.7388